A mask quality control tool for the OSIRIS multi-object spectrograph
OSIRIS multi object spectrograph uses a set of user-customised-masks,
which are manufactured on-demand. The manufacturing process consists of
drilling the specified slits on the mask with the required accuracy.
Ensuring that slits are on the right place when observing is of vital
importance. We present a tool for checking the quality of the process of
manufacturing the masks which is based on analyzing the instrument
images obtained with the manufactured masks on place. The tool extracts
the slit information from these images, relates specifications with the
extracted slit information, and finally communicates to the operator if
the manufactured mask fulfills the expectations of the mask designer.
The proposed tool has been built using scripting languages and using
standard libraries such as opencv, pyraf and scipy. The software
architecture, advantages and limits of this tool in the lifecycle of a
multiobject acquisition are presented.